Semiconductor devices

ABSTRACT

A semiconductor device includes first and second external dummy areas, and a circuit area between the first and second external dummy areas. The circuit area includes circuit active regions and circuit gate lines. Each external dummy area includes an external dummy active region and external dummy gate lines overlapping the external dummy active region and spaced apart from the circuit gate lines. The external dummy active region has a linear shape extending in a first horizontal direction or a shape including active portions isolated from direct contact with each other and extending sequentially in the first horizontal direction. The circuit active regions are between the first and second external dummy active regions and include a first plurality of circuit active regions extending sequentially in the first horizontal direction and a second plurality of circuit active regions extending sequentially in a second horizontal direction perpendicular to the first horizontal direction.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the benefit under 35 U.S.C. § 119 of KoreanPatent Application No. 10-2019-0163999 filed on Dec. 10, 2019 in theKorean Intellectual Property Office, the entire disclosure of which isincorporated herein by reference for all purposes.

BACKGROUND

The present inventive concepts relate to semiconductor devices, and moreparticularly, to semiconductor devices including an active regionincluding a circuit active region and a dummy area including a dummyactive region.

As demand for high performance, high speed, and/or multifunctionality ofsemiconductor devices increases, the degree of integration ofsemiconductor devices is increasing. As the degree of integration ofsemiconductor devices increases, the size of components such as circuitactive regions and the like is reduced. Thus, the reliability of thecircuit active region which becomes small in size becomes low.

SUMMARY

Some example embodiments of the present inventive concepts providesemiconductor devices in which the degree of integration may beimproved.

Some example embodiments of the present inventive concepts providesemiconductor devices in which reliability may be improved whileimproving the degree of integration.

According to some example embodiments of the present inventive concepts,a semiconductor device includes a first external dummy area, a secondexternal dummy area, and a circuit area between the first external dummyarea and the second external dummy area. The circuit area includescircuit active regions and circuit gate lines, the first external dummyarea includes a first external dummy active region and first externaldummy gate lines overlapping the first external dummy active region andspaced apart from the circuit gate lines, the second external dummy areaincludes a second external dummy active region and second external dummygate lines overlapping the second external dummy active region andspaced apart from the circuit gate lines, each of the first and secondexternal dummy active regions has a linear shape extending in a firsthorizontal direction or has a shape including active portions spacedapart from each other while being arranged in the first horizontaldirection, and the circuit active regions are provided as a plurality ofcircuit active regions arranged in the first horizontal direction andare provided as a plurality of circuit active regions arranged in asecond horizontal direction perpendicular to the first horizontaldirection, between the first and second external dummy active regions.

According to some example embodiments of the present inventive concepts,a semiconductor device includes a circuit area, an external dummy areaadjacent the circuit area, and a gate cut insulation region between thecircuit area and the external dummy area. The external dummy areaincludes an external dummy active region and external dummy gate linesoverlapping the external dummy active region, the circuit area includesa plurality of circuit active regions facing the external dummy activeregion and arranged in a first horizontal direction, and circuit gatelines overlapping the plurality of circuit active regions, the externaldummy active region has a linear shape extending in a first horizontaldirection, or has a shape including active portions spaced apart fromeach other while being sequentially arranged in the first horizontaldirection, the gate cut insulation region includes gate cut patternsinterposed between the circuit gate lines and the external dummy gatelines and separating the circuit gate lines and the external dummy gatelines, and the gate cut patterns are arranged in the first horizontaldirection.

According to some example embodiments of the present inventive concepts,a semiconductor device includes a circuit area, and an external dummyarea adjacent to the circuit area. The external dummy area includes anexternal dummy active region extending in a first horizontal direction,and external dummy gate lines overlapping the external dummy activeregion and extending in a second horizontal direction perpendicular tothe first horizontal direction, the circuit area includes circuit activeregions facing the external dummy active region and arranged in pluralin the first horizontal direction, and circuit gate lines overlappingthe circuit active regions and extending in the second horizontaldirection, the external dummy active region has a linear shape extendingin the first horizontal direction, or has a shape including activeportions spaced apart from each other while being arranged in sequencein the first horizontal direction, the circuit active regions include afirst side circuit active region and a second side circuit active regionadjacent to the external dummy active region, a separation distancebetween the external dummy active region and the first side circuitactive region is less than a separation distance between the externaldummy active region and the second side circuit active region, and othercircuit active regions are not interposed between the first externaldummy active region and the first side circuit active region and betweenthe first external dummy active region and the second side circuitactive region.

BRIEF DESCRIPTION OF DRAWINGS

The above and other aspects, features, and advantages of the presentinventive concepts will be more clearly understood from the followingdetailed description, taken in conjunction with the accompanyingdrawings, in which:

FIG. 1A is a plan view illustrating a semiconductor device according tosome example embodiments;

FIGS. 1B and 1C are cross-sectional views illustrating a semiconductordevice according to some example embodiments;

FIGS. 2A and 2B are cross-sectional views illustrating a modifiedexample of a semiconductor device according to some example embodiments;

FIG. 3 is a plan view illustrating a modified example of a semiconductordevice according to some example embodiments;

FIG. 4 is a plan view illustrating a modified example of a semiconductordevice according to some example embodiments;

FIG. 5 is a plan view illustrating a modified example of a semiconductordevice according to some example embodiments;

FIG. 6 is a cross-sectional view illustrating a modified example of asemiconductor device according to some example embodiments; and

FIGS. 7A, 7B, and 7C are diagrams illustrating a modified example of asemiconductor device according to some example embodiments.

DETAILED DESCRIPTION

Hereinafter, semiconductor devices and methods of forming the sameaccording to some example embodiments will be described with referenceto the accompanying drawings.

First, a planar structure of a semiconductor device according to someexample embodiments will be described with reference to FIG. 1A.

FIG. 1A is a plan view illustrating a semiconductor device according tosome example embodiments.

Referring to FIG. 1A, a semiconductor device 1 according to some exampleembodiments may include a first external dummy area DA1, a secondexternal dummy area DA2, and a circuit area CA between the firstexternal dummy area DA1 and the second external dummy area DA2. It willbe understood that at least one external dummy area of the first orsecond external dummy areas DA1 and DA2 may, in some exampleembodiments, be adjacent to the circuit area CA.

The semiconductor device 1 may include a first gate cut insulationregion GC1 between the first external dummy area DA1 and the circuitarea CA, and a second gate cut insulation region GC2 between the secondexternal dummy area DA2 and the circuit area CA.

The circuit area CA may include circuit active regions 6 c and circuitgate lines 30 c. The circuit gate lines 30 c may include gate linesoverlapping the circuit active regions 6 c (e.g., overlapping in thevertical direction D3). Each of the circuit active regions 6 c may havea linear shape or a bar shape extending in a first horizontal directionD1. Each of the circuit gate lines 30 c may have a linear shape or a barshape extending in a second horizontal direction D2 perpendicular to thefirst horizontal direction D1. As shown, the circuit gate lines 30 c maybe understood to be arranged in parallel in the first horizontaldirection D1, such that the circuit gate lines 30 c extend in parallelin the second horizontal direction D2. As shown, at least some of thecircuit active regions 6 c may be spaced apart from each other (e.g.,isolated from direct contact with each other) in the first horizontaldirection D1.

The circuit area CA may further include an internal dummy active region6 cd and internal dummy gate lines 30 cd overlapping the internal dummyactive region 6 cd.

The circuit active regions 6 c may include a first circuit active region6 ca and a second circuit active region 6 cb spaced apart (e.g.,isolated from direct contact with each other) by a distance L3 greaterthan allowable distance ranges L1 and L2. The first circuit activeregion 6 ca and the second circuit active region 6 cb may be spacedapart from each other in the first horizontal direction D1.

Among the circuit active regions 6 c arranged in the first horizontaldirection D1, the remaining circuit active regions except for the firstand second circuit active regions 6 ca and 6 cb are spaced apart fromeach other (e.g., isolated from direct contact with each other) by theallowable distance range L1 or L2, and the internal dummy active region6 cd may be disposed between the first circuit active region 6 ca andthe second circuit active region 6 cb. For example, among the circuitactive regions 6 c adjacent in the first horizontal direction D1, somecircuit active regions may be spaced apart by a first distance L1, someother circuit active regions may be spaced apart by a second distance L2greater than the first distance L1, and some other circuit activeregions may be spaced apart by a third distance L3 greater than thesecond distance L2. In this case, the first distance L1 and the seconddistance L2 may be within an allowable distance range, and the thirddistance L3 may include both cases greater than the allowable distanceranges L1 and L2. The third distance L3 is not limited to a specificnumerical value or a specific size value.

The separation distance L1 between the first circuit active region 6 caand the internal dummy active region 6 cd and the separation distance L1between the second circuit active region 6 cb and the internal dummyactive region 6 cd may each be within the allowable distance ranges L1and L2.

Each of the circuit active regions 6 c may include a circuit activepattern 12 c. The circuit active pattern 12 c may include line patternsparallel to each other. The line patterns of the circuit active pattern12 c may extend in the first horizontal direction D1.

Each of the circuit active regions 6 c may further include a circuitbase pattern 9 c overlapping the circuit active pattern 12 c.

Portions of the circuit active regions 6 c may have different widths inthe second horizontal direction D2.

The internal dummy active region 6 cd may be disposed between the firstcircuit active region 6 ca and the second circuit active region 6 cb.The internal dummy active region 6 cd may be spaced apart from the firstcircuit active region 6 ca and the second circuit active region 6 cb.Each internal dummy active region 6 cd may further include an internaldummy base pattern 9 cd overlapping an internal dummy active pattern 12cd.

The distance L1 between the internal dummy active region 6 cd and thefirst circuit active region 6 ca and the distance L1 between theinternal dummy active region 6 cd and the second circuit active region 6cb may be the first distance L1.

The first external dummy area DA1 may include a first external dummyactive region 6 d 1 and first external dummy gate lines 57 d overlappingthe first external dummy active region 6 d 1 (e.g., overlapping in thevertical direction D3) and spaced apart from (e.g., isolated from directcontact with) the circuit gate lines 30 c. The second external dummyarea DA2 may include a second external dummy active region 6 d 2 andsecond external dummy gate lines 30 d 2 overlapping the second externaldummy active region 6 d 2 (e.g., overlapping in the vertical directionD3) and spaced apart from the circuit gate lines 30 c. As shown in FIG.1A, each external dummy active region of the first external dummy activeregion 6 d 1 and the second external dummy active region 6 d 2 may havea linear shape extending in the first horizontal direction D1.

Between the first and second external dummy active regions 6 d 1 and 6 d2, the circuit active regions 6 c include a plurality of the circuitactive regions 6 c that are arranged in the first horizontal directionD1, and a plurality of the circuit active regions 6 c that are arrangedin the second horizontal direction D2. The circuit active regions 6 carranged (e.g., extending sequentially) in the first horizontaldirection D1 may be referred to as a first plurality of circuit activeregions 6 c, and the circuit active regions 6 c arranged (e.g.,extending sequentially) in the second horizontal direction D2 may bereferred to as a second plurality of circuit active regions 6 c, and thesecond plurality of circuit active regions 6 c may include one or morecircuit active regions of the first plurality of circuit active regions6 c. As shown in FIG. 1A, at least one external dummy active region ofthe first external dummy active region 6 d 1 or the second externaldummy active region 6 d 2 may extend farther in the first horizontaldirection D1 than an end of a circuit active region 6 c that is a lastcircuit active region 6 c among the circuit active regions 6 c extendingsequentially in the first horizontal direction (e.g., the last circuitactive region 6 c of a linear sequence of circuit active regions 6 cextending in the first horizontal direction).

Some of the circuit active regions 6 c may have different lengths in thefirst horizontal direction D1. Some of the circuit active regions 6 cmay have different widths in the second horizontal direction D2.

The circuit active regions 6 c may include a first side circuit activeregion 6 c 1 and a second side circuit active region 6 c 2, where thefirst side circuit active region 6 c 1 and the second side circuitactive region 6 c 2 are both adjacent to the first external dummy activeregion 6 d 1.

Other circuit active regions (e.g., circuit active regions 6 c thatexclude the first side circuit active region 6 c 1 and the second sidecircuit active region 6 c 2) may not be disposed between the firstexternal dummy active region 6 d 1 and the first side circuit activeregion 6 c 1, and the other circuit active regions may not be disposedbetween the first external dummy active region 6 d 1 and the second sidecircuit active region 6 c 2.

In some example embodiments, the separation distance S1 between thefirst external dummy active region 6 d 1 and the first side circuitactive region 6 c 1 may be different from the separation distance S2between the first external dummy active region 6 d 1 and the second sidecircuit active region 6 c 2.

In some example embodiments, the separation distance S1 between thefirst external dummy active region 6 d 1 and the first side circuitactive region 6 c 1 may be less than the separation distance S2 betweenthe first external dummy active region 6 d 1 and the second side circuitactive region 6 c 2.

The first external dummy area DA1 may further include first edge gatelines 30 e 1. The second external dummy area DA2 may further includesecond edge gate lines 30 e 2.

As shown in at least FIG. 1A, the first external dummy gate lines 30 d 1may have the shape of lines or bars parallel to each other, and thesecond external dummy gate lines 30 d 2 may have the shape of lines orbars parallel to each other. As shown in at least FIG. 1A, the firstexternal dummy gate lines 30 d 1 may be between the first edge gatelines 30 e 1 and the circuit gate lines 30 c. As shown in at least FIG.1A, second external dummy gate lines 30 d 2 may be between the secondedge gate lines 30 e 2 and the circuit gate lines 30 c.

In some example embodiments, at least some (e.g., at least portions) ofthe first edge gate lines 30 e 1 may have a “U” shape (e.g., may be “U”shaped). At least some of the second edge gate lines 30 e 2 may have a“U” shape.

The first gate cut region GC1 may include first gate cut patterns 45 a 1sequentially arranged (e.g., extending sequentially) in the firsthorizontal direction D1. The first gate cut patterns 45 a 1 may bedisposed between the first external dummy gate lines 30 d 1 of the firstexternal dummy area DA1 and the circuit gate lines 30 c of the circuitarea CA (e.g., such that each separate first gate cut pattern 45 a 1 maybe between a separate first external dummy gate line 30 d 1 and aseparate circuit gate line 30 c) to separate (e.g., isolate from directcontact) the first external dummy gate lines 30 d 1 from the circuitgate lines 30 c. The first external dummy gate lines 30 d 1 and thecircuit gate lines 30 c may be separated (e.g., isolated from directcontact with each other) by being spaced apart in the second horizontaldirection D2 by the first gate cut patterns 45 a 1.

The second gate cut region GC2 may include second gate cut patterns 45 a2 that are sequentially arranged (e.g., extending sequentially) in thefirst horizontal direction D1. The second gate cut patterns 45 a 2 maybe interposed between the second external dummy gate lines 30 d 2 of thesecond external dummy area DA2 and the circuit gate lines 30 c of thecircuit area CA (e.g., such that each separate second gate cut pattern45 a 2 may be between a separate second external dummy gate line 30 d 2and a separate circuit gate line 30 c). The second external dummy gatelines 30 d 2 and the circuit gate lines 30 c may be separated (e.g.,isolated from direct contact with each other) by being spaced apart inthe second horizontal direction D2 by the second gate cut patterns 45 a2.

The circuit area CA may further include circuit gate cut patterns 45 cseparating the circuit gate lines 30 c in the second horizontaldirection D2 in the circuit area CA.

The first external dummy area DA1 may further include first edge cutpatterns 45 b 1 between the first edge gate lines 30 e 1 and the firstexternal dummy gate lines 30 d 1. The first edge cut patterns 45 b 1 mayseparate the first edge gate lines 30 e 1 and the first external dummygate lines 30 d 1 (e.g., isolate the first edge gate lines 30 e 1 andthe first external dummy gate lines 30 d 1 from direct contact with eachother) in the second horizontal direction D2. As shown, the firstexternal dummy gate lines 30 d 1 may be between the first edge cutpatterns 45 b 1 and the first gate cut patterns 45 a 1. In some exampleembodiments, at least portions of (e.g., some or all of) the firstand/or second edge cut patterns 45 b 1 and 45 b 2 may have a “U” shape.

The second external dummy area DA2 may further include second edge cutpatterns 45 b 2 between the second edge gate lines 30 e 2 and the secondexternal dummy gate lines 30 d 2. The second edge cut patterns 45 b 2may separate the second edge gate lines 30 e 2 and the second externaldummy gate lines 30 d 2 in the second horizontal direction D2.

In some example embodiments, the first and second gate cut patterns 45 a1 and 45 a 2, the circuit gate cut patterns 45 c, and the first andsecond edge cut patterns 45 b 1 and 45 b 2 may be formed of (e.g., mayat least partially include and/or may be completely comprised of) thesame insulating material, such as a silicon oxide, a silicon oxynitrideor a silicon nitride.

In some example embodiments, the first external dummy area DA1 and thesecond external dummy area DA2 may be formed in a mirror symmetricalstructure with the circuit area CA interposed therebetween.

The first external dummy active region 6 d 1 may include a first dummyactive pattern 12 d 1. The second external dummy active region 6 d 2 mayinclude a second dummy active pattern 12 d 2.

Each of the first and second external dummy active regions 6 d 1 and 6 d2 may have a linear shape extending in the first horizontal directionD1.

In some example embodiments, the first dummy active pattern 12 d 1 mayinclude a plurality of line patterns parallel to each other. The linepatterns of the first dummy active pattern 12 d 1 may extend in thefirst horizontal direction D1.

As illustrated in FIG. 1A, the line patterns of the first dummy activepattern 12 d 1 may be two, but example embodiments thereof are notlimited thereto. For example, the line patterns of the first dummyactive pattern 12 d 1 may be two or more than two.

In some example embodiments, the first external dummy active region 6 d1 may further include a first dummy base pattern 9 d 1. The secondexternal dummy active region 6 d 2 may further include a second dummybase pattern 9 d 2. The first dummy active pattern 12 d 1 may overlapthe first dummy base pattern 9 d 1. The second dummy active pattern 12 d2 may overlap the second dummy base pattern 9 d 2.

Next, a cross-sectional structure of a semiconductor device according tosome example embodiments will be described with reference to FIGS. 1Band 1C.

FIG. 1B is a cross-sectional view illustrating a region taken along lineI-I′ of FIG. 1A to describe a semiconductor device according to someexample embodiments, and FIG. 1C is a cross-sectional view illustratingregions taken along lines II-II′ and III-III′ of FIG. 1A to describe asemiconductor device according to some example embodiments. In thecross-sectional structure of a semiconductor device according to someexample embodiments with reference to FIGS. 1B and 1C, the componentsdescribed with reference to FIG. 1A will be directly referred to withoutfurther descriptions. In addition, since the first external dummy areaDA1 and the second external dummy area DA2 may be mirror symmetricalstructures, the cross-sectional structure of the second external dummyarea DA2 will not be described below. The cross-sectional structure ofthe second external dummy area DA2 may be mirror symmetrical to thecross-sectional structure of the first external dummy area DA1, and thusmay be understood to be substantially the same as each other.

It will be understood that elements may be recited herein as being “thesame” as other elements, and it will be further understood that elementsrecited herein as being “the same” as other elements may be “the same”or “substantially the same” as the other elements, where elements thatare “substantially the same” as other elements will be understood to bethe same as the other elements within manufacturing tolerances and/ormaterial tolerances. Elements that are the same or substantially thesame as other elements may be structurally the same or substantially thesame, functionally the same or substantially the same, and/orcompositionally the same or substantially the same.

Referring to FIGS. 1A, 1B and 1C, the semiconductor device 1 may furtherinclude a semiconductor substrate 3 and an isolation region 18 on thesemiconductor substrate 3.

The circuit active pattern 12 c may be disposed on the circuit basepattern 9 c.

In the case of the circuit active pattern 12 c, one or more circuitactive patterns 12 c may extend from an upper surface of the circuitbase pattern 9 c in a vertical direction D3. Accordingly, it will beunderstood that each circuit active region 6 c may include the circuitbase pattern 9 c and one or more circuit active patterns 12 c extendingin the vertical direction from the circuit base pattern 9 c. As shown inat least FIG. 1B, a width of a circuit base pattern 9 c of a circuitactive region 6 c in the second horizontal direction may be greater thana width of each circuit active pattern 12 c of the one or more circuitactive patterns 12 c of the circuit active region 6 c in the secondhorizontal direction. The vertical direction D3 may be a directionperpendicular to an upper surface 3 s of the semiconductor substrate 3.A first dummy active pattern 12 d 1 may be disposed on the first dummybase pattern 9 d 1. In the case of the first dummy active pattern 12 d1, one or more first dummy active patterns 12 d 1 may extend from theupper surface of the first dummy base pattern 9 d 1 in the verticaldirection D3. Accordingly, it will be understood that each firstexternal dummy active region 6 d 1 may include the first dummy basepattern 9 d 1 and one or more first dummy active patterns 12 d 1extending in the vertical direction from the first dummy base pattern 9d 1. As shown in at least FIG. 1B, a width of a first dummy base pattern9 d 1 of a first external dummy active region 6 d 1 in the secondhorizontal direction may be greater than a width of each first dummyactive pattern 12 d 1 of the one or more first dummy active patterns 12d 1 of the first external dummy active region 6 d 1 in the secondhorizontal direction.

The isolation region 18 may include a first isolation region 20 and asecond isolation region 22. The first isolation region 20 may define thefirst dummy active pattern 12 d 1 and the circuit active pattern 12 c,and the second isolation region 22 may define the first dummy basepattern 9 d 1 and the circuit base pattern 9 c.

Each of the circuit active regions 6 c may further include a circuitchannel region 12 cc extending from the circuit active pattern 12 c inthe vertical direction D3 and adjacent to a circuit source/drain region24 c.

The first external dummy active region 6 d 1 may further include a dummychannel region 12 dc extending from the first dummy active pattern 12 d1 in the vertical direction D3 and adjacent to a dummy source/drainregion 24 d.

Each of the circuit gate lines 30 c may include a first gate dielectriclayer 33 c, a first gate electrode 36 c, and a first gate capping layer39 c. The first gate dielectric layer 33 c may cover side and bottomsurfaces of the first gate electrode 36 c. The first gate capping layer39 c may be disposed on the first gate electrode 36 c.

Each of the first external dummy gate lines 30 d 1 may include a secondgate dielectric layer 33 d, a second gate electrode 36 d, and a secondgate capping layer 39 d. The second gate dielectric layer 33 d may coverside and bottom surfaces of the second gate electrode 36 d. The secondgate capping layer 39 d may be disposed on the second gate electrode 36d.

The second gate dielectric layer 33 d, the second gate electrode 36 d,and the second gate capping layer 39 d may be referred to as a dummygate dielectric layer, a dummy gate electrode, and a dummy gate cappinglayer, respectively.

Each of the first edge gate lines 30 e 1 may include a third gatedielectric layer 33 e, a third gate electrode 36 e, and a third gatecapping layer 39 e. The third gate dielectric layer 33 e may cover sideand bottom surfaces of the third gate electrode 36 e. The third gatecapping layer 39 e may be disposed on the third gate electrode 36 e.

As shown in at least FIG. 1B, at least one of the circuit gate lines 30c may cover the upper and side surfaces of at least one of the circuitchannel region 12 cc of the circuit active pattern 12 c (e.g., maydirectly contact said upper and side surfaces as shown) and may extendonto the isolation region 18.

As shown in at least FIG. 1B, at least one of the first external dummygate lines 30 d 1 may cover the upper and side surfaces of at least onedummy channel region 12 dc of the first dummy active pattern 12 d 1(e.g., may directly contact said upper and side surfaces as shown) andmay extend onto the isolation region 18.

Upper surfaces of the first gate electrodes 36 c of the circuit gatelines 30 c and the second gate electrodes 36 d of the first externaldummy gate lines 30 d 1 may be located on higher levels than the uppersurface of the circuit channel region 12 cc and the upper surface of thefirst dummy active pattern 12 d 1.

In some example embodiments, the semiconductor device 1 may furtherinclude a circuit source/drain region 24 c and a dummy source/drainregion 24 d. Restated, the circuit area CA may include a circuitsource/drain region 24 c on (e.g., above) the circuit active regions 6c, and at least the first external dummy area DA1 may include a dummysource/drain region 24 d on (e.g., above) the first external dummyactive regions 6 d 1.

The circuit source/drain regions 24 c may be disposed in plural, and maybe adjacent to the circuit channel regions 12 cc in the first horizontaldirection D1, on the circuit active patterns 12 c.

The first horizontal direction D1 may be parallel to the upper surface 3s of the semiconductor substrate 3.

The dummy source/drain region 24 d may be provided as a plurality ofdummy source/drain regions 24 d, and the dummy source/drain regions 24 dmay be adjacent to the dummy channel region 12 dc in the firsthorizontal direction D1, on the first dummy active patterns 12 d 1.

In some example embodiments, the semiconductor device 1 may furtherinclude an interlayer insulating layer 27 on the isolation region 18.

A first circuit contact plug 48 c may be disposed on (e.g., directly on)the circuit source/drain region 24 c, such that the first circuitcontact plug 48 c is configured to be electrically connected to thecircuit source/drain region 24 c. A second circuit contact plug 48 g maybe disposed on the first gate electrode 36 c to penetrate through thefirst gate capping layer 39 c.

In some example embodiments, a dummy source/drain contact plug 48 ds maybe disposed on the dummy source/drain region 24 d.

In some example embodiments, a dummy gate contact plug 48 dg penetratingthrough the first gate capping layer 39 c may be disposed on the secondgate electrode 36 d.

In some example embodiments, the semiconductor device 1 may furtherinclude a first gate spacer 42 c, a second gate spacer 42 d, and a thirdgate spacer 42 e.

The first gate spacer 42 c may be interposed between the circuit gatelines 30 c and the first circuit contact plug 48 c and between thecircuit gate lines 30 c and the interlayer insulating layer 27.

The second gate spacer 42 d may be interposed between the first externaldummy gate lines 30 d 1 and the dummy source/drain contact plug 48 ds,and may be interposed between the first external dummy gate lines 30 d 1and the interlayer insulating layer 27. The third gate spacer 42 e maybe interposed between the first edge gate lines 30 e 1 and theinterlayer insulating layer 27.

The first to third gate spacers 42 c, 42 d and 42 e may be formed of aninsulating material such as silicon nitride, silicon oxynitride, siliconoxide or the like.

In some example embodiments, the semiconductor device 1 may furtherinclude a first contact spacer 47 c and a second contact spacer 47 d.The first and second contact spacers 47 c and 47 d may be formed of aninsulating material such as silicon oxide.

The first contact spacer 47 c may surround the side surface of the firstcircuit contact plug 48 c. The second contact spacer 47 d may surroundthe side surface of the dummy source/drain contact plug 48 ds.

In some example embodiments, the semiconductor device 1 may furtherinclude an upper insulating layer 51 disposed on the interlayerinsulating layer 27, the circuit gate lines 30 c, the first externaldummy gate lines 30 d 1 and the first edge gate lines 30 e 1.

In some example embodiments, the semiconductor device 1 may furtherinclude a first circuit via 54 c and a second circuit via 54 gpenetrating through the upper insulating layer 51.

The first circuit via 54 c may be on, and in contact with the firstcircuit contact plug 48 c, such that the first circuit via 54 c isconfigured to be electrically connected to the first circuit contactplug 48 c, and the second circuit via 54 g may be in contact with thesecond circuit contact plug 48 g.

In some example embodiments, the semiconductor device 1 may include afirst circuit wiring 57 c, a second circuit wiring 57 g, and a dummywiring 57 d that are disposed at the same height level on the upperinsulating layer 51 (e.g., at a same distance from the upper surface 3 sof semiconductor substrate 3, such that the dummy wiring 57 d overlapsthe dummy source/drain region 24 d in the vertical direction D3).

The first circuit wiring 57 c may be electrically connected to the firstcircuit via 54 c (e.g., based on being in contact therewith), and thesecond circuit wiring 57 g may be electrically connected to the secondcircuit via 54 g. The dummy wiring 57 d may be electrically isolated(e.g., electrically insulated from the dummy source/drain region 24 d).For example, the dummy wiring 57 d may overlap the dummy source/drainregion 24 d and may be electrically insulated from the dummysource/drain region 24 d.

Next, a modification of the cross-sectional structure of the regiontaken along line I-I′ of FIG. 1B will be described with reference toFIG. 2A.

FIG. 2A is a cross-sectional view illustrating a modification of thecross-sectional structure of FIG. 1B.

In a variant, referring to FIG. 2A, the dummy gate contact plug (48 dgin FIG. 1B) in FIG. 1B may be omitted. A dummy gate via 54 dg (e.g., a“dummy via”) penetrating through the upper insulating layer 51 andcontacting the upper surface of the second gate capping layer 39 d maybe disposed. The dummy gate via 54 dg may be electrically insulated fromthe second gate electrode, for example, the second gate electrode 36 d.Accordingly, the first external dummy area DA1 may include one of thedummy gate contact plug (48 dg in FIG. 1B) or the dummy gate via (54 dgin FIG. 2A), on the second gate electrode 36 d, and may not include theother (e.g., may include a dummy gate contact plug 48 dg and not a dummygate via 54 dg, such that the dummy gate contact plug 48 dg iselectrically connected to a dummy source/drain region 24 d and may beelectrically insulated from dummy wiring 57 d, or a dummy gate via 54 dgand not a dummy gate contact plug 48 dg, such that the dummy gate via 54dg is electrically insulated from the dummy source/drain region 24 d andmay be electrically connected to the dummy wiring 57 d).

Next, a modification of the cross-sectional structure of the regiontaken along line II-II′ of FIG. 1C will be described with reference toFIG. 2B.

FIG. 2B is a cross-sectional view illustrating a modification of thecross-sectional structure of FIG. 1C.

In a variant, referring to FIG. 2B, regions from which the dummysource/drain contact plug (48 ds of FIG. 1C) and the second contactspacer (47 d of FIG. 1C) described in FIG. 1C are omitted and removedand the dummy source/drain contact plug (48 ds of FIG. 1C) and thesecond contact spacer (47 d of FIG. 1C) described in FIG. 1C are omittedand removed, may be filled with the interlayer insulating layer 27.Accordingly, the entire upper surface of the dummy source/drain region24 d may be covered by the interlayer insulating layer 27.

A dummy source/drain via 54 ds may be formed to penetrate through theupper insulating layer 51, and may contact the interlayer insulatinglayer 27, above the dummy source/drain region 24 d. The dummysource/drain via 54 ds may contact the dummy wiring 57 d of FIG. 1C.Accordingly, it will be understood that, in some example embodiments,the first external dummy area DA1 may include one of the dummysource/drain contact plug 48 ds or the dummy source/drain via 54 dswherein, when the first external dummy area DA1 includes the dummysource/drain contact plug 48 ds and does not include the dummysource/drain via 54 ds (e.g., as shown in FIG. 1C), the dummysource/drain contact plug 48 ds is electrically connected to the dummysource/drain region 24 d and is electrically insulated from the dummywiring 57 d, and when the first external dummy area DA1 does not includethe dummy source/drain contact plug 48 ds and includes the dummysource/drain via 54 ds (e.g., as shown in FIG. 2B), the dummysource/drain via 54 ds is electrically insulated from the dummysource/drain region 24 d and is electrically connected to the dummywiring 57 d.

The first external dummy area DA1 may include one of the dummysource/drain contact plug (48 ds of FIG. 1C) described in FIG. 1C or thedummy source/drain via 54 ds in FIG. 2B above the dummy source/drainregion 24 d, and may not include the other thereof. Therefore, the dummysource/drain region 24 d may be electrically insulated from the dummywiring 57 d.

Next, a modified example of the components constituting the first dummyarea DA1 of FIG. 1A will be described with reference to FIG. 3.

FIG. 3 is a partially enlarged plan view illustrating portions of thefirst dummy area DA1, the first gate cut insulation region GC1, and thecircuit area CA of FIG. 1A.

In a modified example, referring to FIG. 3, in the first dummy area DA1,the first edge cut patterns 45 b 1 of FIG. 1A may be omitted, and thefirst edge gate lines 30 e 1 of FIG. 1A and the first external dummygate lines 30 d 1 of FIG. 1A may be connected to each other to formdummy gate lines 130 d. As shown in at least FIG. 3, when viewed in planview, the first edge gate lines 30 e 1 of FIG. 1A and the first externaldummy gate lines 30 d 1 of FIG. 1A may be continuously connected to eachother (e.g., part of a single, continuous piece of material) to form thedummy gate lines 130 d.

One of the dummy gate lines 130 d may include line portions 130 da and130 db and a connection portion 130 dc connecting the line portions 130da and 130 db. The line portions 130 da and 130 db may have the shape oflines or bars parallel to each other, and the connection portion 130 dcmay have a “U” shape.

Next, a modified example of the components constituting the first dummyarea DA1 of FIG. 1A will be described with reference to FIG. 4.

FIG. 4 is a partially enlarged plan view illustrating portions of thefirst dummy area DA1, the first gate cut insulation area GC1, and thecircuit area CA of FIG. 1A.

In a modified example, referring to FIG. 4, in the first dummy area DA1,the first edge gate lines 30 e 1 described with reference to FIG. 1A maybe replaced with the first edge cut patterns (45 b 1 in FIG. 1A).Accordingly, the first dummy area DA1 may include edge dummy patterns,at least portions of which are “U” shaped, which may be the edge cutpatterns 145 b, which may be formed of a same material as a material ofthe first gate cut patterns 45 a 1, or the first edge gate lines 30 e 1,which may be formed of a same material as a material of the firstexternal dummy gate lines 30 d 1, and where the first external dummygate lines 30 d 1 are between the edge dummy patterns (e.g., 145 b or 30e 1) and the first gate cut patterns 45 a 1. For example, the structureof the first edge gate lines 30 e 1 of FIG. 1A may be replaced with thesame cross-sectional structure as that of the first edge cut patterns 45b 1 of FIG. 1A. Accordingly, the first edge gate lines 30 e 1 of FIG. 1Aand the first edge cut patterns 45 b 1 of FIG. 1A may be combined toform edge cut patterns 145 b, at least portions of which (e.g., some orall of which) may have a “U” shape. The edge cut patterns 145 b may havethe same cross-sectional structure as that of the first edge cutpatterns 45 b 1 of FIG. 1A.

Next, a modified example of the components constituting the first dummyarea DA1 of FIG. 1A will be described with reference to FIG. 5.

FIG. 5 is a partially enlarged plan view illustrating portions of thefirst dummy area DA1, the first gate cut insulation area GC1, and thecircuit area CA of FIG. 1A.

In a modification, referring to FIG. 5, in the first dummy area DA1, thefirst external dummy active region (6 d 1 in FIG. 1A), which extends inthe first horizontal direction D1 and may be (e.g., have) one linearshape, may be replaced with an external dummy active region 106 dincluding active portions spaced apart from (e.g., isolated from directcontact with) each other and arranged in sequence (e.g., extendingsequentially, extending in sequence, extending in series, etc.) in thefirst horizontal direction D1. It will be understood that elementsextending sequentially in a direction may be referred to as a linearsequence of said elements.

Each of the active portions of the external dummy active region 106 dmay have a line or bar shape extending in the first horizontal directionD1.

As shown in at least FIG. 5, the circuit active regions 6 c may includea plurality of circuit active regions 6 c sequentially arranged (e.g.,extending sequentially, extending in sequence, extending in series,etc.) in the first horizontal direction D1 while facing the activeportions of the external dummy active region 106 d.

Each of the active portions of the external dummy active region 106 dmay include a dummy active pattern 112 d and a dummy base pattern 109 doverlapping the dummy active pattern 112 d. The dummy active pattern 112d and the dummy base pattern 109 d may correspond to the first dummyactive pattern 12 d 1 of FIG. 1A and the first dummy base pattern 9 d 1of FIG. 1A, respectively.

As illustrated in FIG. 5, the external dummy active region 106 dincluding the active portions spaced apart from each other while beingsequentially arranged in the first horizontal direction D1 may replacethe first external dummy active region 6 d 1 of FIGS. 3 and 4.

Next, a modification of the semiconductor device according to someexample embodiments will be described with reference to FIG. 6.

FIG. 6 is a cross-sectional view illustrating a modified example of thecross-sectional structure of FIG. 1B.

Referring to FIG. 6, the base patterns 9 c, 9 d 1, 9 d 2, and 109 ddescribed with reference to FIGS. 1 to 5 may be omitted. For example,the first dummy base pattern 9 d 1 of FIG. 1B and the circuit basepattern 9 c of FIG. 1B may be omitted. Accordingly, the first dummyactive pattern 12 d 1 of FIG. 1B may be replaced with a dummy activepattern 212 d extending in the vertical direction D3 from an uppersurface 3 s of a semiconductor substrate 3, including a dummy channelregion 212 dc extending from the dummy active pattern 212 d in thevertical direction D3. The circuit active pattern (12 c of FIG. 1B)described with reference to FIG. 1B may be replaced with a circuitactive pattern 212 c extending in the vertical direction D3 from theupper surface 3 s of the semiconductor substrate 3, including a circuitchannel region 212 cc extending from the circuit active pattern 212 c inthe vertical direction D3. The vertical direction D3 may beperpendicular to the upper surface 3 s of the semiconductor substrate 3.

The first isolation region 20 in FIG. 1B may be replaced with anisolation region 220 defining the dummy active pattern 212 d and thecircuit active pattern 212 c.

Next, a modified example of the planar structure of the semiconductordevice according to some example embodiments, including the exampleembodiments described with reference to FIG. 1A will be described withreference to FIG. 7A.

FIG. 7A is a plan view that may correspond to the plan view of FIG. 1A.

Referring to FIG. 7A, a semiconductor device 300 according to someexample embodiments may include a first external dummy area DA1, asecond external dummy area DA2 and a circuit area CA between the dummyarea DA1 and the second external dummy area DA2, which are substantiallythe same as those described with reference to FIG. 1A. The semiconductordevice 300 may include a first gate cut insulation region GC1 betweenthe first external dummy area DA1 and the circuit area CA, and a secondgate cut insulation region GC2 between the second external dummy areaDA2 and the circuit area CA may be included. The second external dummyarea DA2 and the circuit area CA may be substantially the same as thosedescribed with reference to FIG. 1A.

The circuit area CA may include circuit active regions 306 c and circuitgate lines 330 c. The circuit gate lines 330 c may have substantiallythe same planar shape as that of the circuit gate lines (30 c of FIG.1A) described with reference to FIG. 1A.

The circuit active regions 306 c may have a planar shape substantiallysimilar to that of the circuit active regions (6 c of FIG. 1A) describedwith reference to FIG. 1A.

The circuit area CA may further include an internal dummy active region306 cd corresponding to the internal dummy active region (6 cd in FIG.1A) described with reference to FIG. 1A, between circuit active regions306 ca and 306 cb, and internal dummy gate lines 330 cd corresponding tothe internal dummy gate lines (30 cd in FIG. 1A) described withreference to FIG. 1A.

The first external dummy area DA1 may further include a first externaldummy active region 306 d 1 that may correspond to the first externaldummy active region 6 d 1 of FIG. 1A, and first external dummy gatelines 330 d 1 that may correspond to the first external dummy gate lines30 d 1 of FIG. 1A. The first external dummy area may further includefirst edge gate lines 330 e 1 that may correspond to the first edge gatelines 30 e 1 of FIG. 1A.

In some example embodiments, the separation distance S1′ between thefirst external dummy active region 306 d 1 and the first side circuitactive region 306 c 1 may be different from (e.g., smaller than) theseparation distance S2′ between the first external dummy active region306 d 1 and the second side circuit active region 306 c 2.

The second external dummy area DA2 may include a second external dummyactive region 306 d 2 that may correspond to the second external dummyactive region 6 d 2 of FIG. 1A, and second external dummy gate lines 330d 2 that may correspond to the second external dummy gate lines 330 d 2of FIG. 1A. The second external dummy area DA2 may further includesecond edge gate lines 330 e 2 that may correspond to the second edgegate lines 30 e 2 of FIG. 1A.

The first gate cut region GC1 may include first gate cut patterns 345 a1 corresponding to the first gate cut patterns 45 a 1 of FIG. 1A. Thesecond gate cut region GC2 may include second gate cut patterns 345 a 2corresponding to the second gate cut patterns 45 a 2 of FIG. 1A. Thecircuit area CA may further include circuit gate cut patterns 345 c thatmay correspond to the circuit gate cut patterns 45 c of FIG. 1A.

The first external dummy area DA1 may further include first edge cutpatterns 345 b 1 that may correspond to the first edge cut patterns 45 b1 of FIG. 1A. The second external dummy area DA2 may further includesecond edge cut patterns 345 b 2 that may correspond to the second edgecut patterns 45 b 2 of FIG. 1A.

Next, a modification of the semiconductor device according to someexample embodiments will be described with reference to FIGS. 7B and 7C.

FIG. 7B is a cross-sectional view illustrating a region taken along lineIa-Ia′ of FIG. 7A to describe a semiconductor device according to someexample embodiments, and FIG. 7C is a cross-sectional view illustratinga region taken along line IIa-IIa′ and a region taken along lineIIIc-IIIc′ of FIG. 7A to describe a semiconductor device according tosome example embodiments.

Referring to FIGS. 7A, 7B, and 7C, the semiconductor device 300 mayfurther include a semiconductor substrate 303 and an isolation region320 on the semiconductor substrate 303.

The circuit active region 306 c may include a circuit active pattern 312c extending in a vertical direction D3 from an upper surface 303 s ofthe semiconductor substrate 303, and circuit active layers 312 cc,spaced apart from each other in the vertical direction D3 (e.g.,isolated from direct contact with each other and extending sequentiallyin the vertical direction D3 from the circuit active pattern 312 c), onthe circuit active pattern 312 c and adjacent to the circuitsource/drain region(s) 324 c.

The first external dummy active region 306 d 1 may include a dummyactive pattern 312 d extending in the vertical direction D3 from theupper surface 303 s of the semiconductor substrate 303, and dummy activelayers 312 dc spaced apart from each other in the vertical direction D3(e.g., isolated from direct contact with each other and extendingsequentially in the vertical direction D3 from the dummy active pattern312 d), on the dummy active pattern 312 d. The isolation region 320 maydefine the dummy active pattern 312 d and the circuit active pattern 312c and adjacent to the dummy source/drain region(s) 324 d.

Each of the circuit gate lines 330 c may include a first gate dielectriclayer 333 c, a first gate electrode 336 c, and a first gate cappinglayer 339 c. The first gate dielectric layer 333 c may cover side andbottom surfaces of the first gate electrode 336 c. The first gatecapping layer 339 c may be disposed on the first gate electrode 336 c.

Each of the first external dummy gate lines 330 d 1 may include a secondgate dielectric layer 333 d, a second gate electrode 336 d, and a secondgate capping layer 339 d. The second gate dielectric layer 333 d maycover side and bottom surfaces of the second gate electrode 336 d. Thesecond gate capping layer 339 d may be disposed on the second gateelectrode 336 d.

Each of the first edge gate lines 330 e 1 may include a third gatedielectric layer 333 e, a third gate electrode 336 e, and a third gatecapping layer 339 e. The third gate dielectric layer 333 e may coverside and bottom surfaces of the third gate electrode 336 e. The thirdgate capping layer 339 e may be disposed on the third gate electrode 336e.

The circuit gate lines 330 c may extend onto the isolation region 320while surrounding the respective circuit active layers 312 cc. Forexample, as shown in at least FIG. 7B, at least one of the circuit gatelines 330 c may extend in the second horizontal direction D2 to cover anupper surface, a bottom surface and one or more (or all) side surfacesof each of the circuit active layers 312 cc.

The first external dummy gate lines 330 d 1 may extend onto theisolation region 320 while surrounding the dummy active layers 312 dc.For example, at least one of the first external dummy gate lines 330 d 1may extend in the second horizontal direction D2 to cover an uppersurface, a bottom surface and one or more (or all) side surfaces of eachof the dummy active layers 312 dc.

In some example embodiments, the semiconductor device 300 may furtherinclude a circuit source/drain region 324 c and a dummy source/drainregion 324 d.

The circuit source/drain regions 324 c may be disposed in plural, andmay be adjacent to the circuit active layers 312 cc in the firsthorizontal direction D1, on the circuit active patterns 12 c.

The dummy source/drain region 324 d may be disposed in plural, and maybe adjacent to the dummy active layers 312 dc in the first horizontaldirection D1, on the dummy active patterns 312 d.

In some example embodiments, the semiconductor device 300 may furtherinclude an interlayer insulating layer 327 on the isolation region 320.

A first circuit contact plug 348 c may be disposed on the circuitsource/drain region 324 c. A second circuit contact plug 348 gpenetrating through the first gate capping layer 339 c may be disposedon the first gate electrode 336 c.

In some example embodiments, a dummy source/drain contact plug 348 dsmay be disposed on the dummy source/drain region 324 d.

In some example embodiments, a dummy gate contact plug 348 dg may bedisposed on the second gate electrode 336 d, to penetrate through thefirst gate capping layer 339 c.

In some example embodiments, the semiconductor device 300 may furtherinclude a first gate spacer 342 c, a second gate spacer 342 d, and athird gate spacer 342 e.

The first gate spacer 342 c may be interposed between the circuit gatelines 330 c and the first circuit contact plug 348 c and between thecircuit gate lines 330 c and the interlayer insulating layer 327.

The second gate spacer 342 d may be interposed between the firstexternal dummy gate lines 330 d 1 and the dummy source/drain contactplug 348 ds, and may be interposed between the first external dummy gatelines 330 d 1 and the interlayer insulating layer 327. The third gatespacer 342 e may be interposed between the first edge gate lines 330 e 1and the interlayer insulating layer 327.

In some example embodiments, the semiconductor device 300 may furtherinclude a first contact spacer 347 c and a second contact spacer 347 d.The first and second contact spacers 347 c and 347 d may be formed of aninsulating material such as silicon oxide or the like.

The first contact spacer 347 c may surround the side surface of thefirst circuit contact plug 348 c. The second contact spacer 347 d maysurround the side surface of the dummy source/drain contact plug 348 ds.

In some example embodiments, the semiconductor device 300 may furtherinclude an upper insulating layer 351 disposed on the interlayerinsulating layer 327, the circuit gate lines 330 c, the first externaldummy gate lines 330 d 1 and the first edge gate lines 330 e 1.

In some example embodiments, the semiconductor device 300 may furtherinclude a first circuit via 354 c and a second circuit via 354 gpenetrating through the upper insulating layer 351.

The first circuit via 354 c may be in contact with the first circuitcontact plug 348 c, and the second circuit via 354 g may be in contactwith the second circuit contact plug 348 g.

In some example embodiments, the semiconductor device 300 may include afirst circuit wiring 357 c, a second circuit wiring 357 g and a dummywiring 357 d disposed on the same level of height on the upperinsulating layer 351.

The first circuit wiring 357 c may be electrically connected to thefirst circuit via 354 c, and the second circuit wiring 357 g may beelectrically connected to the second circuit via 354 g. The dummy wiring357 d may overlap the dummy source/drain region 324 d and may beelectrically insulated from the dummy source/drain region 324 d.

In some example embodiments, the dummy source/drain contact plug 348 dsmay be omitted, while the dummy source/drain via (54 ds in FIG. 2B), asin FIG. 2B, overlapping the dummy source/drain region 324 d, may also bedisposed.

In some example embodiments, the first external dummy active region 306d 1 and the circuit active regions 306 c may replace the first externaldummy active region 6 d 1 and the circuit active regions 6 c illustratedin FIGS. 1A through 5, respectively.

According to some example embodiments, by disposing the first and secondexternal dummy areas DA1 and DA2 adjacent to the circuit area CA,reliability of the circuit active regions 6 c and 306 c positioned onthe ends of the circuit gate lines 30 c and 330 c in the secondhorizontal direction D2 in the circuit area CA may be improved.

According to some example embodiments, the semiconductor devices 1 and300 may include the first and second external dummy areas DA1 and DA2adjacent to the circuit area CA, thereby preventing the reliability ofthe circuit active regions 6 c and 306 c from being lowered even whenthe size of the circuit active regions 6 c and 306 c is reduced toincrease the degree of integration.

Accordingly, a semiconductor device having a planar layout, capable ofincreasing the reliability of the circuit active regions 6 c and 306 cpositioned on the ends of the circuit gate lines 30 c and 330 c in thesecond horizontal direction D2, and a semiconductor device having across-sectional structure provided by such layout, may be provided.

As set forth above, according to some example embodiments, a layoutcapable of increasing reliability of circuit active regions adjacent toend portions of gate lines, and a semiconductor device disposed by thelayout, may be provided.

While example embodiments have been illustrated and described above, itwill be apparent to those skilled in the art that modifications andvariations could be made without departing from the scope of the presentinventive concepts as defined by the appended claims.

What is claimed is:
 1. A semiconductor device, comprising: a firstexternal dummy area; a second external dummy area; and a circuit areabetween the first external dummy area and the second external dummyarea, wherein the circuit area includes circuit active regions andcircuit gate lines, wherein the first external dummy area includes afirst external dummy active region and first external dummy gate linesoverlapping the first external dummy active region in a verticaldirection, the first external dummy gate lines isolated from directcontact with the circuit gate lines, wherein the second external dummyarea includes a second external dummy active region and second externaldummy gate lines overlapping the second external dummy active region inthe vertical direction, the second external dummy gate lines isolatedfrom direct contact with the circuit gate lines, wherein each dummyactive region of the first external dummy active region and the secondexternal dummy active region has a linear shape extending in a firsthorizontal direction, or a shape including active portions isolated fromdirect contact with each other and extending sequentially in the firsthorizontal direction, and wherein the circuit active regions are betweenthe first external dummy active region and the second external dummyactive region, and the circuit active regions include a first pluralityof circuit active regions extending sequentially in the first horizontaldirection, and a second plurality of circuit active regions extendingsequentially in a second horizontal direction perpendicular to the firsthorizontal direction.
 2. The semiconductor device of claim 1, furthercomprising: a first gate cut insulation region between the firstexternal dummy area and the circuit area; and a second gate cutinsulation region between the second external dummy area and the circuitarea, wherein the first gate cut insulation region includes first gatecut patterns between the circuit gate lines and the first external dummygate lines, wherein the second gate cut insulation region includessecond gate cut patterns between the circuit gate lines and the secondexternal dummy gate lines.
 3. The semiconductor device of claim 1,wherein the first external dummy area further includes first edge gatelines, the first external dummy gate lines are between the first edgegate lines and the circuit gate lines, the first external dummy gatelines have a shape of lines or bars parallel to each other, and at leastportions of the first edge gate lines are “U” shaped.
 4. Thesemiconductor device of claim 3, wherein the first external dummy areafurther comprises first edge cut patterns between the first edge gatelines and the first external dummy gate lines to isolate the first edgegate lines and the first external dummy gate lines from direct contactwith each other.
 5. The semiconductor device of claim 3, wherein whenviewed in plan view, the first edge gate lines and the first externaldummy gate lines are part of a single, continuous piece of material. 6.The semiconductor device of claim 3, wherein the first external dummyactive region includes the active portions isolated from direct contactwith each other while extending sequentially in the first horizontaldirection, each active portion of the active portions has a shape of aline or a bar extending in the first horizontal direction, and thecircuit active regions include active regions extending sequentially inthe first horizontal direction while facing the active portions of thefirst external dummy active region.
 7. The semiconductor device of claim1, wherein the circuit active regions include a first side circuitactive region and a second side circuit active region, the first sidecircuit active region and the second side circuit active region bothadjacent to the first external dummy active region, a distance betweenthe first external dummy active region and the first side circuit activeregion is less than a distance between the first external dummy activeregion and the second side circuit active region, and other circuitactive regions of the circuit active regions are not between the firstexternal dummy active region and the first side circuit active regionand are not between the first external dummy active region and thesecond side circuit active region.
 8. The semiconductor device of claim1, further comprising: first gate cut patterns isolating the circuitgate lines and the first external dummy gate lines from direct contactwith each other, the first gate cut patterns between the circuit gatelines and the first external dummy gate lines, wherein the firstexternal dummy area further includes first edge cut patterns, whereinthe first external dummy gate lines are between the first edge cutpatterns and the first gate cut patterns, wherein the first gate cutpatterns and the first edge cut patterns include a same insulatingmaterial, wherein the first external dummy gate lines have a shape oflines or bars parallel to each other, and wherein at least portions ofthe first edge cut patterns have a “U” shape.
 9. The semiconductordevice of claim 1, wherein the circuit area further includes an internaldummy active region, the circuit active regions are isolated from directcontact with each other in the first horizontal direction, the circuitactive regions include a first circuit active region and a secondcircuit active region isolated from direct contact with each other by adistance greater than an allowable distance range, among the circuitactive regions arranged in the first horizontal direction, remainingcircuit active regions except for the first and second circuit activeregions are isolated from direct contact with each other by theallowable distance range, and the internal dummy active region isbetween the first circuit active region and the second circuit activeregion.
 10. The semiconductor device of claim 9, wherein a distancebetween the first circuit active region and the internal dummy activeregion, and a distance between the second circuit active region and theinternal dummy active region, are each within the allowable distancerange.
 11. The semiconductor device of claim 1, wherein the circuit areafurther includes a circuit source/drain region on the circuit activeregions, a circuit contact plug on the circuit source/drain region, suchthat the circuit contact plug is configured to be electrically connectedto the circuit source/drain region, a circuit via on the circuit contactplug, such that the circuit via is configured to be electricallyconnected to the circuit contact plug, and a circuit wiring electricallyconnected to the circuit via, the first external dummy area furtherincludes a dummy source/drain region on the first external dummy activeregion, and a dummy wiring overlapping the dummy source/drain region andlocated at a same height level as the circuit wiring, and the dummywiring is electrically insulated from the dummy source/drain region. 12.The semiconductor device of claim 11, wherein the first external dummyarea further includes one of a dummy contact plug and not a dummy via,such that the dummy contact plug is electrically connected to the dummysource/drain region and is electrically insulated from the dummy wiring,or a dummy via and not a dummy contact plug, such that the dummy via iselectrically insulated from the dummy source/drain region and iselectrically connected to the dummy wiring.
 13. The semiconductor deviceof claim 1, wherein the circuit area further includes a circuitsource/drain region on the circuit active regions, a circuit contactplug on the circuit source/drain region, such that the circuit contactplug is configured to be electrically connected to the circuitsource/drain region, a circuit via on the circuit contact plug, suchthat the circuit via is configured to be electrically connected to thecircuit contact plug, and a circuit wiring electrically connected to thecircuit via, the first external dummy area further includes a dummysource/drain region on the first external dummy active region, the firstexternal dummy area further includes one of a dummy contact plug and nota dummy via, such that the dummy contact plug is electrically connectedto the dummy source/drain region, or a dummy via and not a dummy contactplug, such that the dummy via is electrically insulated from the dummysource/drain region.
 14. The semiconductor device of claim 1, whereinthe circuit area further includes circuit source/drain regions, thefirst external dummy area further includes dummy source/drain regions,each circuit active region of the circuit active regions includes acircuit active pattern and a circuit channel region extending in thevertical direction from the circuit active pattern and adjacent to thecircuit source/drain regions, the first external dummy active regionincludes a dummy active pattern and a dummy channel region extending inthe vertical direction from the dummy active pattern and adjacent to thedummy source/drain regions, at least one circuit gate line of thecircuit gate lines covers an upper surface and a side surface of thecircuit channel region, and at least one first external dummy gate lineof the first external dummy gate lines covers an upper surface and aside surface of the dummy channel region.
 15. The semiconductor deviceof claim 1, wherein the circuit area further includes circuitsource/drain regions, the first external dummy area further includesdummy source/drain regions, each circuit active region of the circuitactive regions includes a circuit active pattern and circuit activelayers on the circuit active pattern, the circuit active layers isolatedfrom direct contact with each other and extending sequentially in thevertical direction from the circuit active pattern and adjacent to thecircuit source/drain regions, the first external dummy active regionincludes a dummy active pattern and dummy active layers on the dummyactive pattern, the dummy active layers isolated from direct contactwith each other and extending sequentially in the vertical directionfrom the dummy active pattern and adjacent to the dummy source/drainregions, at least one circuit gate line of the circuit gate linesextends in the second horizontal direction to cover an upper surface, abottom surface and a side surface of each circuit active layer of thecircuit active layers, and at least one first external dummy gate lineof the first external dummy gate lines extends in the second horizontaldirection to cover an upper surface, a bottom surface and a side surfaceof each dummy active layer of the dummy active layers.
 16. Thesemiconductor device of claim 1, wherein at least one external dummyactive region of the first external dummy active region or the secondexternal dummy active region extends farther in the first horizontaldirection than an end of a circuit active region that is a last circuitactive region among the circuit active regions extending sequentially inthe first horizontal direction.
 17. A semiconductor device, comprising:a circuit area; an external dummy area adjacent the circuit area; and agate cut insulation region between the circuit area and the externaldummy area, wherein the external dummy area includes an external dummyactive region and external dummy gate lines overlapping the externaldummy active region in a vertical direction, wherein the circuit areaincludes circuit active regions facing the external dummy active regionand extending sequentially in a first horizontal direction, and circuitgate lines overlapping the circuit active regions in the verticaldirection, wherein the external dummy active region has a linear shapeextending in the first horizontal direction, or a shape including activeportions isolated from direct contact with each other and extendingsequentially in the first horizontal direction, wherein the gate cutinsulation region includes gate cut patterns between the circuit gatelines and the external dummy gate lines and isolating the circuit gatelines and the external dummy gate lines from direct contact with, andwherein the gate cut patterns extend sequentially in the firsthorizontal direction.
 18. The semiconductor device of claim 17, whereinthe external dummy area further comprises edge dummy patterns, at leastportions of the edge dummy patterns are “U” shaped, the external dummygate lines are between the edge dummy patterns and the gate cutpatterns, and the edge dummy patterns are edge gate lines formed of asame material as a material of the external dummy gate lines, or edgecut patterns formed of a same material as a material of the gate cutpatterns.
 19. A semiconductor device, comprising: a circuit area; and anexternal dummy area adjacent to the circuit area, wherein the externaldummy area includes an external dummy active region extending in a firsthorizontal direction, and external dummy gate lines overlapping theexternal dummy active region in a vertical direction and extending in asecond horizontal direction perpendicular to the first horizontaldirection, wherein the circuit area includes circuit active regionsfacing the external dummy active region and extending sequentially inthe first horizontal direction, and circuit gate lines overlapping thecircuit active regions in the vertical direction and extending inparallel in the second horizontal direction, wherein the external dummyactive region has a linear shape extending in the first horizontaldirection, or a shape including active portions isolated from directcontact with each other and extending sequentially in the firsthorizontal direction, wherein the circuit active regions include a firstside circuit active region and a second side circuit active region, thefirst side circuit active region and the second side circuit activeregion both adjacent to the external dummy active region, wherein adistance between the external dummy active region and the first sidecircuit active region is less than a distance between the external dummyactive region and the second side circuit active region, and whereinother circuit active regions of the circuit active regions are notbetween the external dummy active region and the first side circuitactive region and are not between the external dummy active region andthe second side circuit active region.
 20. The semiconductor device ofclaim 19, further comprising: a semiconductor substrate; and anisolation region on the semiconductor substrate, wherein each circuitactive region of the circuit active regions includes a circuit basepattern and one or more circuit active patterns extending in thevertical direction from the circuit base pattern, wherein the externaldummy active region includes a dummy base pattern and one or more dummyactive patterns extending in the vertical direction from the dummy basepattern, wherein a width of the circuit base pattern in the secondhorizontal direction is greater than a width of each circuit activepattern of the one or more circuit active patterns in the secondhorizontal direction, and wherein a width of the dummy base pattern inthe second horizontal direction is greater than a width of each dummyactive pattern of the one or more dummy active patterns in the secondhorizontal direction.